磁控溅射法沉积TCO薄膜的电源技术

[18] Helmersson U, Lattemann M, Bohlmark J. Ionized physical vapor deposition (IPVD):

A review of technology and applications [J]. Thin Solid Films, 2006, 513(1):1～24.

[19] Christie D.J, Tomasel F., Sproul W.D. Power supply with arc handling for

high peak power magnetron sputtering [J].Journal of Vacuum Science Technology A: Vacuum,

Surfaces, and Films, 2004, 22(4):1415～1420.

[20] Ganciu M, Konstantinidis S, Paint Y. Preionised pulsed magnetron discharges for

ionised physical vapour deposition [J]. Journal of Optoelectronics and Advanced Materials,

2005, 7(5):2481～2484.

[21] Musil J, Lestina J, Vlcek J. Pulsed dc magnetron discharge for highrate sputtering

of thin films [J]. Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films,

2001, 19(2): 420～424.

[22] Sittinger V, Ruske F, Werner W. High power pulsed magnetron sputtering of transparent

conducting oxides [J]. Thin Solid Films, 2008, 516(17): 5847～5859.■